< PLD System: Prof. Jihoon Lee’s group
at Kwangwoon Univ. >
Pulsed laser deposition (PLD) is a thin film deposition (specifically a physical vapor deposition, PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). This process can occur in ultra high vacuum or in the presence of a background gas, such as oxygen which is commonly used when depositing oxides to fully oxygenate the deposited films.