< RTP System: Prof. Jihoon Lee’s group
at Kwangwoon Univ. >
Rapid thermal processing (RTP) is a semiconductor manufacturing process which heats silicon wafers to high temperatures (over 1,000 °C) on a timescale of several seconds or less.
During cooling, however, wafer temperatures must be brought down slowly to prevent dislocations and wafer breakage due to thermal shock. Such rapid heating rates are often attained by high intensity lamps or lasers.
These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflow and chemical vapor deposition.